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 Growth Characteristics Of Glancing Angle Deposited (GLAD) Thin Films

Alireza Dolatshahi-Pirouz

DOI: 10.5185/amlett.2014.7591

Keywords:

GLAD; shadowing effect; nanotopography; surface diffusion; thin film scaling behavior. 

Abstract: 

 This paper investigates the effect of surface diffusion and re-emission on the surface morphology of GLAD thin films. This was done through GLAD of platinum and tantalum at two different surface temperatures (293 K and 153 K). The effect of shadowing during the thin film growth was examined by utilizing Atomic force microscopy (AFM) to determine the root-mean square (rms) value, the surface roughness, and thus the growth exponent β. Our results showed that β was not affected by substrate temperature during deposition, however it increased from β = 0.47 ± 0.06 to β = 0.94 ± 0.12 as the thin film material was switched from platinum to tantalum. The change in the growth exponent b indicates that the kinetics of the film growth at grazing incidence are primarily influenced by re-emission and shadowing effects with surface diffusion playing a minor role. 

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