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Structural Properties Of Fe Doped TiO2 Films On LaAlO3 And Si Substrates

Komal Bapna, R.J. Choudhary, D.M. Phase

Volume 2, Issue 4, Page 281-284 | DOI: 10.5185/amlett.indias.205

Keywords:

Thin film; doped TiO2; pulsed laser deposition; X-ray diffraction; DMS

Abstract: 

We have prepared 4 at.% Fe doped TiO2 thin films on LAO (001) and Si (111) substrates by pulsed laser deposition. X-ray diffraction (XRD) studies suggest different structural properties of the films on the different substrates. Raman measurements corroborate the XRD findings. The thicknesses of the films are also different on the two substrates, suggesting different nucleation process on the two substrates. Interestingly on both the substrates, Fe is not in metal clusters, suggesting their possible incorporation in TiO2 matrix. Copyright © 2011 VBRI press.

 

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